xLight is building extremely powerful lasers called free electron lasers that produce the specific type of light needed to manufacture the most advanced computer chips.

Today's chipmaking light sources are running up against physical limits, and xLight's technology could provide four times more light while using less energy and fewer consumable materials. Current EUV light sources from ASML use energy-intensive tin plasma lasers that provide only 25% of the light future lithography demands; xLight's FEL approach directly emits EUV light with programmable wavelengths, eliminating consumables like tin and hydrogen. A single xLight source can feed multiple lithography machines, fundamentally changing fab economics.

The surging demand for AI chips is pushing semiconductor manufacturers to their limits, creating urgent need for more productive and cost-efficient lithography solutions that xLight's technology directly addresses.

xLight closed an oversubscribed $40M Series B led by Playground Global in July 2025, and in December 2025 signed a $150M Letter of Intent with the U.S. Department of Commerce under the CHIPS Act — the first award from the Trump Administration's CHIPS R&D Office.